History Timeline

1936-1979

  • 1936 April : Started as TOKYO OHKA RESEARCH LABORATORY.
  • 1940 October : Reorganized as a joint-stock company, TOKYO OHKA KOGYO CO., LTD.
  • 1967 January : SAGAMI PLANT (present SAGAMI OPERATION CENTER) began operations.

1980-1989

  • 1980 November : Held the 1st TOKYO OHKA SEMINAR (semiconductor technology seminar).
  • 1981 June : UTSUNOMIYA PLANT (our first full-scale mass production plant for photoresists used in semiconductor manufacturing) began operations.
  • 1983 February : SAGAMI SECOND PLANT (present SHONAN TECHNICAL CENTER) began operations.
  • December : KUMAGAYA PLANT (plant for manufacturing industrial chemicals) began operations.
  • 1984 January : YAMANASHI PLANT (exclusive plant for manufacturing photopolymer printing plates) began operations.
  • October : PROCESS EQUIPMENT PLANT (within SAGAMI SECOND PLANT / present SHONAN TECHNICAL CENTER) began operations.
  • December : ASO PLANT began operations.
  • 1986 July : Listed in the Second Section of Tokyo Stock Exchange.
  • 1987 March : Established OHKA AMERICA, INC. in California, U.S.
  • June : GOTEMBA PLANT began operations.
  • September : Established OHKA (UK) LTD. (present OHKA EUROPE LTD.).
  • 1989 April : Established T.O.K. INTERNATIONAL, INC. in Oregon, U.S.
  • October : IKUNO PLANT began operations.
  • November : Held the 10th TOKYO OHKA SEMINAR.

1990-1995

  • 1990 September : Listed in the First Section of Tokyo Stock Exchange.
  • November : Held the 1st TOKYO OHKA SEMINAR in Korea.
  • 1992 October : Established TOK ENGINEERING CO., LTD.
  • December : Merged OHKA AMERICA, INC. and T.O.K. INTERNATIONAL, INC. (OHKA AMERICA, INC. / present TOKYO OHKA KOGYO AMERICA, INC.).
  • 1993 May : OREGON PLANT of OHKA AMERICA, INC. (present TOKYO OHKA KOGYO AMERICA, INC.) began operations.
  • 1994 February : KORIYAMA PLANT began operations.
  • May : Held the 1st TOKYO OHKA SEMINAR in Taiwan.
  • 1995 May : Established TOK ITALIA S.p.A.

1996-1999

  • 1996 July : Acquired ISO 9002 registration for GOTEMBA PLANT and SAGAMI OPERATION CENTER.
  • October : Dry Film Resist plant of TOK ITALIA S.p.A. began operations.
  • 1997 February : Completed construction of new research building in SAGAMI OPERATION CENTER.
  • March : Established TOK TECHNO SERVICE CO., LTD.
  • May : Completed construction of our first oversea photoresist manufacturing plant for semiconductor fabrication at OREGON PLANT of OHKA AMERICA, INC.
  • December : Completed the third phase construction (manufacturing plant of photoresists for deep-UV) of KORIYAMA PLANT, and started the manufacture.
  • 1998 January : Established TOK TAIWAN CO., LTD.
  • April : Completed construction of new research building in SHONAN PLANT (present SHONAN TECHNICAL CENTER).
  • 1999 May : Acquired ISO 9002 registration for all the plants of Manufacturing Department.
  • November : Held the 20th TOKYO OHKA SEMINAR.
  • : Stripper / thinner manufacturing plant of TOK TAIWAN CO., LTD. began operations.
  • : Acquired ISO 14001 registration for KORIYAMA, UTSUNOMIYA and GOTEMBA PLANT.

2000-

  • 2000 August : Completed construction (July) of the new headquarters building at the site that its Kawasaki Plant had used to stand, and has moved to the new headquarters.
  • 2001 February : Developed TARF-P series (High-resolution, positive type photoresist for ArF excimer lasers).
  • March : Developed DELS series (Dielectric Layer sheet for PDP).
  • October : Completed construction of ELASLON manufacturing line in YAMANASHI PLANT.
  • December : Developed TELR-P series (Positive type photoresist for Organic EL Display).
  • 2002 March : Developed TR63000 (Large square substrate coater / Developer system).
  • : Developed OEBR-CAN021 (Negative type photoresist for electron beams).
  • August : Established SINGAPORE REPRESENTATIVE OFFICE.
  • : Completed construction of PDP manufacturing material production plant in KORIYAMA PLANT.
  • October : Established SHANGHAI REPRESENTATIVE OFFICE.
  • 2003 February : Completed construction of new research building in SAGAMI OPERATION CENTER.
  • October : SEOUL MARKETING OFFICE began operations.
  • November : DISTRIBUTION CONTROL CENTER began operations.
  • December : Developed TMMR (Permanent photoresist for MEMS).
  • 2004 September : Established TOK KOREA CO., LTD.
  • October : Established CHANG CHUN TOK (CHANGSHU) CO., LTD.
  • 2005 December : Established TOKYO OHKA KOGYO EUROPE B.V.
  • 2006 January : OHKA AMERICA, INC. has changed its name to TOKYO OHKA KOGYO AMERICA, INC.
  • February : OHKA EUROPE LTD. has transferred all its business to TOKYO OHKA KOGYO EUROPE B.V.
  • : Completed construction of new research building in SAGAMI OPERATION CENTER.
  • 2007 April : Completed construction of new research building in SAGAMI OPERATION CENTER.
  • 2008 March : Completed construction of office building in Aso Pant.
  • 2008 November : Developed TWM/TWR series ?wafer handling system for processing through-silicon vias?.
  • 2008 December : Developed TR165000FC series?float coating system?.
  • 2009 April : Completed construction of stripping solution manufacturing plant in TOKYO OHKA KOGYO AMERICA, INC.?Oregon Plant?.
  • June : Developed EPLUS?diffusion source for photovoltaic?.
  • 2011 January : Newly organized Marketing Division, Marketing Department.
  • June : Newly organized New Business Development Division, New Business Development Department.
  • November : Built a new production line of semiconductor photoresist in Koriyama plant.
  • 2012 August : Established TOK ADVANCED MATERIALS CO., LTD.
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