ArF Immersion Resist

TOK manufactures ArF Immersion photo resist materials in the 193nm range to respond to the next generation requirements for advanced miniaturization technology made capable by ArF Immersion photo resists. We manufacture positive photo resists in our top of the line facility in Japan. If you have a project and are searching for an ArF Immersion photo resist solution, please contact us and we can provide more specific data about our product lineup.