g-Line Resist

TOK g-Line Photoresist Solutions

TOK manufactures g-Line photoresist materials for applications with film thickness from 1um to 7um for the 436nm wavelength. We manufacture both positive and negative photo resists in our g-Line product lineup. All g-Line photoresists are manufactured in our facilities in Japan. If you have a project and are searching for a g-Line photoresist solution, please contact us and we can provide more specific data about our product lineup.

G Line Resist Roadmap